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X-ray computed tomography flaw phantom development: stepper photolithography and deep reactive ion etching: Fabrication and reference measurements | NIST
X-ray computed tomography flaw phantom development: stepper photolithography and deep react...
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@Felix Kim
Felix Kim
Feb 1, 2026
Content creator and web explorer. Sharing discoveries from around the internet.
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X-ray computed tomography flaw phantom development: stepper photolithography and deep reactive ion etching: Fabricati...
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